University of Toronto

Faculty of Applied Science & Engineering

ChemE Seminar: LEIS – Analysis of Outer Surface, Shallow Interfaces and Ultra-Thin Layers

Event date: Tuesday, March 22, 2011, at 10:30 AM
Location: Wallberg Building, Room 215


In modern technology new (sub-) nanometer materials and preparation techniques are being developed. Advancement heavily relies on the availability of analytic techniques that can validate and support the preparation. One of the new analytic techniques that is being used is Low Energy Ion Scattering (LEIS). Its unique surface sensitivity makes it possible to selectively determine the atomic composition of the outer atoms of the surface, and thus precisely the atoms that largely control catalysis, growth and adhesion.

After an introduction of the technique and its new features, the focus will be on applications where valuable information has been obtained that is impossible to obtain with other analytic techniques such as SIMS and XPS. The new possibilities will be illustrated with applications to catalysts, solid oxide fuel sells, growth of ultra-thin layers, nanoclusters and self-assembled monolayers.

The findings will be compared and contrasted to those obtained by analytic techniques such as XPS, toF-SIMS, AFM/STM and conventional LEIS.

This session is hosted by the Department of Chemical Engineering and Applied Chemistry.

Faculty of Applied Science and Engineering | University of Toronto
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Toronto, Ontario • M5S 1A4 • Canada
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